Cov pa roj carbon tetraflide (cf4)

Kev tsis muaj

Cov pa roj carbon Tetraflluoride yog halogenated hydrocarbon nrog tshuaj chemical cf4. Nws tuaj yeem suav tias yog halogenated hydrocarbon, halogenated Methane, Perfluorocarbon, lossis raws li cov inorganic compound. Cov pa roj carbon tetraflide yog cov pa roj tsis muaj kob thiab tsis muaj ntxhiab, insoluble hauv dej, soluble hauv benzene thiab chloroform. Ruaj khov nyob rau hauv qhov kub thiab txias thiab lub siab, zam kom tsis txhob muaj cov neeg oxidants muaj zog, cov khoom tawg lossis cov khoom sib txuas. Cov roj tsis sib xyaw, cov twj siab sab hauv, lub zog sab hauv yuav nce ntxiv thaum raug cov phom sij, thiab muaj kev phom sij ntawm kev tawg thiab tawg. Nws yog tshuaj tsis ruaj khov thiab tsis yog-taws. Tsuas yog kua ammonia-sodium hlau reagent tuaj yeem ua haujlwm ntawm chav sov. Cov pa roj carbon Tetraflluoride yog cov pa roj uas ua rau lub tsev cog khoom nyhuv. Nws yog ruaj khov, tuaj yeem nyob twj ywm hauv cov huab cua ntev, thiab yog lub tsev cog khoom muaj zog heev roj. Cov pa roj carbon Tetrafllubles yog siv nyob rau hauv lub plasma etching txheej txheem ntawm ntau yam kev sib xyaw ua ke. Nws kuj yog siv los ua cov roj laser, thiab siv hauv cov khoom siv tsawg, cov kuab tshuaj, lubricants, cov khoom siv tshuaj insulating, thiab txias rau infrared detectors. Nws yog qhov ntshav uas siv tshaj plaws etching roj nyob rau hauv microelectronics kev lag luam. Nws yog kev sib xyaw ntawm Tetrarafluoromethane siab-huv roj thiab tetrafluoromethane siab thiab siab purity oxygen. Nws tuaj yeem yog siv dav hauv silicon, silicon dioxide, sioson nitride, thiab phosphosilicate iav. Qhov etching ntawm nyias zaj duab xis cov ntaub ntawv xws li tungsten thiab tungsten tseem dav siv nyob rau hauv cov khoom siv hluav taws xob, lub hnub ci tsawg tshuaj, thiab xab npum hauv cov luam tawm hluav taws xob. Siv raws li cov tub yees tsawg-txias thiab ntshav qhuav etching technology rau kev sib xyaw ua ke. Xyuam xim rau cia: Muab cia rau hauv qhov chaw txias, qhov cua tsis-compressible Gas Warehouse. Tseg deb ntawm hluav taws thiab cov khoom cua sov. Qhov kub yuav tsum tsis pub tshaj 30 ° C. Nws yuav tsum tau muab cais tawm los ntawm yooj yim (combustible) combustibles thiab oxidants, thiab zam kev sib xyaw. Cov chaw cia khoom yuav tsum tau nruab nrog cov khoom siv thaum muaj xwm ceev.

Daim Ntawv Thov:

Lub tub yees:

TetraTruorongethans qee zaum siv los ua cov tub yees tsawg.

② etching:

Nws yog siv rau hauv electronics microugrabrication me lossis hauv kev sib xyaw ua ke nrog oxygen zoo li lub plasma etchant rau silicon, silicon dioxide, thiab silicon nitride.

Pob khoom ib txwm:

Hom tau zoo:

①high purity, qhov chaw kawg;

②Iso cov chaw muag khoom muaj npe;

③Fast Kev Xa;

④on-line-lic-kab System rau kev tswj hwm kom zoo nyob rau txhua kauj ruam;

⑤high xav tau thiab cov txheej txheem meticulous rau tuav lub tog raj kheej ua ntej sau;