Kub-muag Tuam Tshoj High Purity Carbon Tetrafluoride CF4 Gas rau Semiconductor Kev Lag Luam Etching

Peb niaj hnub ua peb tus ntsuj plig ntawm "Innovation nqa kev vam meej, Zoo siab ua qee yam kev noj qab haus huv, Kev tswj hwm kev lag luam tau txiaj ntsig, Cov qhab nia zoo nyiam cov neeg siv khoom kub muag Tuam Tshoj High Purity Carbon Tetrafluoride CF4 Gas rau Semiconductor Kev Lag Luam Etching, Peb sov siab txais tos cov phooj ywg los ntawm txhua qhov chaw ntawm kev lag luam. kev ua neej nyob niaj hnub mus yos hav zoov kev sib koom tes thiab tsim kom muaj kev ci ntsa iab thiab zoo nkauj dua tag kis.
Peb niaj hnub ua peb tus ntsuj plig ntawm "Innovation coj kev nce qib, Ua tau zoo ua qee yam kev noj qab haus huv, Kev tswj hwm kev lag luam tau txiaj ntsig, credit qhab nia nyiam cov neeg siv khoom rauTuam Tshoj CF4 Refrigerant Gas, Gas Lub tog raj kheej, Peb yog koj tus khub txhim khu kev qha hauv kev lag luam thoob ntiaj teb nrog cov khoom zoo tshaj plaws. Peb qhov zoo yog kev tsim kho tshiab, hloov tau yooj yim thiab kev ntseeg siab uas tau tsim nyob rau hauv nees nkaum xyoo dhau los. Peb tsom mus rau kev muab kev pabcuam rau peb cov neeg siv khoom raws li lub hauv paus tseem ceeb hauv kev ntxiv dag zog rau peb txoj kev sib raug zoo mus ntev. Peb tsis tu ncua muaj cov kev daws teeb meem qib siab hauv kev ua ke nrog peb cov kev muag khoom ua ntej thiab kev pab cuam tom qab muag zoo ua kom muaj kev sib tw muaj zog hauv kev lag luam thoob ntiaj teb.

Technical Parameters

Carbon tetrafluoride yog halogenated hydrocarbon nrog cov tshuaj formula CF4. Nws tuaj yeem suav tau tias yog halogenated hydrocarbon, halogenated methane, perfluorocarbon, lossis raws li cov khoom siv tsis zoo. Cov pa roj carbon tetrafluoride yog cov roj tsis muaj xim thiab tsis muaj ntxhiab tsw, insoluble hauv dej, soluble hauv benzene thiab chloroform. Nyob ruaj khov nyob rau hauv ib txwm kub thiab siab, tsis txhob muaj zog oxidants, flammable los yog combustible cov ntaub ntawv. Cov roj uas tsis yog-combustible, lub siab sab hauv ntawm lub thawv yuav nce ntxiv thaum raug kub kub, thiab muaj kev phom sij ntawm kev tawg thiab tawg. Nws yog chemically ruaj khov thiab tsis-flammable. Tsuas yog kua ammonia-sodium hlau reagent tuaj yeem ua haujlwm ntawm chav tsev kub. Cov pa roj carbon tetrafluoride yog cov pa roj uas ua rau lub tsev cog qoob loo. Nws ruaj khov heev, tuaj yeem nyob hauv huab cua ntev ntev, thiab yog lub tsev cog khoom muaj zog heev. Cov pa roj carbon tetrafluoride yog siv rau hauv cov txheej txheem plasma etching ntawm ntau yam sib xyaw ua ke. Nws kuj yog siv los ua cov roj laser, thiab yog siv rau hauv cov tub yees txias, cov kuab tshuaj, cov roj nplua nyeem, cov ntaub ntawv insulating, thiab cov khoom cua txias rau cov cuab yeej infrared. Nws yog cov roj plasma etching ntau tshaj plaws hauv kev lag luam microelectronics. Nws yog kev sib xyaw ntawm tetrafluoromethane high-purity gas thiab tetrafluoromethane high-purity gas thiab high-purity oxygen. Nws tuaj yeem siv dav hauv silicon, silicon dioxide, silicon nitride, thiab phosphosilicate iav. Lub etching ntawm nyias zaj duab xis cov ntaub ntawv xws li tungsten thiab tungsten kuj yog siv dav hauv kev ntxuav ntawm cov khoom siv hluav taws xob, lub hnub ci ntawm tes, laser technology, qis kub tub yees, tshuaj ntsuam xyuas, thiab tshuaj ntxuav tes hauv kev luam tawm Circuit Court. Siv raws li qhov kub thiab txias txias thiab plasma qhuav etching tshuab rau kev sib xyaw ua ke. Kev ceev faj rau kev khaws cia: Khaws rau hauv qhov chaw txias, qhov cua uas tsis yog-combustible gas warehouse. Khaws kom deb ntawm qhov hluav taws kub thiab cua sov. Qhov kub cia yuav tsum tsis pub tshaj 30 ° C. Nws yuav tsum tau muab cais los ntawm yooj yim (combustible) combustibles thiab oxidants, thiab tsis txhob sib tov cia. Lub chaw cia khoom yuav tsum tau nruab nrog cov khoom siv kho mob thaum muaj xwm ceev.

Daim ntawv thov:

① Refrigerant:

Tetrafluoromethane yog qee zaum siv los ua cov tub yees txias.

② Etching:

Nws yog siv nyob rau hauv electronics microfabrication ib leeg los yog ua ke nrog oxygen raws li ib tug plasma etchant rau silicon, silicon dioxide, thiab silicon nitride.

Cov pob li qub:

Qhov zoo:

① High purity, qhov chaw tshiab;

② ISO daim ntawv pov thawj chaw tsim khoom;

③ Kev xa khoom sai;

④On-line tsom xam qhov system rau kev tswj kom zoo hauv txhua kauj ruam;

⑤ Cov kev xav tau siab thiab cov txheej txheem zoo rau kev tuav lub tog raj kheej ua ntej sau;Peb niaj hnub ua peb tus ntsuj plig ntawm "Innovation nqa kev vam meej, Zoo siab ua qee yam kev noj qab haus huv, Kev tswj hwm kev lag luam tau txiaj ntsig, Cov qhab nia zoo nyiam cov neeg siv khoom kub muag Tuam Tshoj High Purity Carbon Tetrafluoride CF4 Gas rau Semiconductor Kev Lag Luam Etching, Peb sov siab txais tos cov phooj ywg los ntawm txhua qhov chaw ntawm kev lag luam. kev ua neej nyob niaj hnub mus yos hav zoov kev sib koom tes thiab tsim kom muaj kev ci ntsa iab thiab zoo nkauj dua tag kis.
Kub muagTuam Tshoj CF4 Refrigerant Gas, Gas Lub tog raj kheej, Peb yog koj tus khub txhim khu kev qha hauv kev lag luam thoob ntiaj teb nrog cov khoom zoo tshaj plaws. Peb qhov zoo yog kev tsim kho tshiab, hloov tau yooj yim thiab kev ntseeg siab uas tau tsim nyob rau hauv nees nkaum xyoo dhau los. Peb tsom mus rau kev muab kev pabcuam rau peb cov neeg siv khoom raws li lub hauv paus tseem ceeb hauv kev ntxiv dag zog rau peb txoj kev sib raug zoo mus ntev. Peb tsis tu ncua muaj cov kev daws teeb meem qib siab hauv kev ua ke nrog peb cov kev muag khoom ua ntej thiab kev pab cuam tom qab muag zoo ua kom muaj kev sib tw muaj zog hauv kev lag luam thoob ntiaj teb.