Cov Ntaub Ntawv Txog Roj Boron Trichloride BCL3

Boron trichloride (BCl3)yog ib qho inorganic compound feem ntau siv rau hauv cov txheej txheem qhuav etching thiab cov tshuaj vapor deposition (CVD) hauv kev tsim khoom semiconductor. Nws yog ib qho roj tsis muaj xim nrog lub ntxhiab tsw qab ntawm chav tsev kub thiab rhiab heev rau huab cua noo vim nws hydrolyzes los tsim hydrochloric acid thiab boric acid.

Cov ntawv thov ntawm Boron Trichloride

Hauv kev lag luam semiconductor,Boron trichloridefeem ntau yog siv rau kev etching qhuav ntawm txhuas thiab ua ib qho dopant los tsim cov cheeb tsam P-hom ntawm silicon wafers. Nws kuj tseem siv tau los etch cov ntaub ntawv xws li GaAs, Si, AlN, thiab ua ib qho chaw boron hauv qee qhov kev siv tshwj xeeb. Tsis tas li ntawd, Boron trichloride yog siv dav hauv kev ua hlau, kev lag luam iav, kev tshuaj ntsuam tshuaj thiab kev tshawb fawb hauv chaw kuaj mob.

Kev Nyab Xeeb ntawm Boron Trichloride

Boron trichlorideyog corrosive thiab lom thiab tuaj yeem ua rau puas tsuaj loj rau lub qhov muag thiab daim tawv nqaij. Nws hydrolyzes nyob rau hauv huab cua noo noo kom tso tawm cov pa roj hydrogen chloride lom. Yog li ntawd, yuav tsum tau ua cov kev ntsuas kev nyab xeeb tsim nyog thaum tuavBoron trichloride, suav nrog hnav khaub ncaws tiv thaiv, tsom iav thiab cov khoom siv tiv thaiv kev ua pa, thiab ua haujlwm hauv qhov chaw muaj cua nkag zoo.


Lub sijhawm tshaj tawm: Lub Ib Hlis-17-2025