Epitaxial (kev loj hlob)Sib xyaw Gas

Hauv kev lag luam semiconductor, cov roj siv los cog ib lossis ntau txheej ntawm cov khoom siv los ntawm kev tso cov pa tshuaj rau ntawm cov khoom siv xaiv zoo hu ua epitaxial gas.

Cov roj silicon epitaxial feem ntau siv suav nrog dichlorosilane, silicon tetrachloride thiabsilaneFeem ntau siv rau epitaxial silicon deposition, silicon oxide zaj duab xis deposition, silicon nitride zaj duab xis deposition, amorphous silicon zaj duab xis deposition rau lub hnub ci hlwb thiab lwm yam photoreceptors, thiab lwm yam. Epitaxy yog ib qho txheej txheem uas ib qho khoom siv crystal tau tso thiab loj hlob ntawm qhov chaw ntawm lub substrate.

Cov Pa Tshuaj Lom Zem (CVD) Cov Pa Sib Xyaws

CVD yog ib txoj kev tso qee yam khoom thiab cov tshuaj sib xyaw los ntawm cov tshuaj lom neeg theem roj siv cov tshuaj sib xyaw ua ke, piv txwv li, ib txoj kev tsim zaj duab xis siv cov tshuaj lom neeg theem roj. Nyob ntawm hom zaj duab xis tsim, cov roj tso pa tshuaj lom neeg (CVD) siv kuj txawv.

Kev siv tshuaj dopingCov Roj Sib Xyaws

Hauv kev tsim cov khoom siv semiconductor thiab cov circuits sib xyaw ua ke, qee yam impurities raug doped rau hauv cov ntaub ntawv semiconductor kom muab cov ntaub ntawv qhov xav tau conductivity hom thiab qee yam resistivity los tsim cov resistors, PN junctions, faus txheej, thiab lwm yam. Cov roj siv hauv cov txheej txheem doping hu ua doping gas.

Feem ntau suav nrog arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, thiab lwm yam.

Feem ntau, qhov chaw doping yog sib xyaw nrog cov roj nqa (xws li argon thiab nitrogen) hauv lub txee qhov chaw. Tom qab sib tov, cov roj ntws raug txhaj tshuaj tas li rau hauv lub cub tawg diffusion thiab nyob ib puag ncig lub wafer, tso cov dopants rau ntawm qhov chaw ntawm lub wafer, thiab tom qab ntawd reacting nrog silicon los tsim cov hlau doped uas migrate mus rau hauv silicon.

Kev kos duabCov roj sib xyaw

Kev khawb yog khawb cov nto ua tiav (xws li zaj duab xis hlau, zaj duab xis silicon oxide, thiab lwm yam) ntawm lub substrate yam tsis muaj photoresist masking, thaum khaws thaj chaw nrog photoresist masking, kom tau txais cov qauv duab xav tau ntawm qhov chaw substrate.

Cov txheej txheem etching suav nrog kev etching siv tshuaj ntub thiab kev etching siv tshuaj qhuav. Cov roj siv hauv kev etching siv tshuaj qhuav hu ua roj etching.

Cov roj etching feem ntau yog cov roj fluoride (halide), xws licarbon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, thiab lwm yam.