Epitaxial (kev loj hlob)Mixed Gas

Hauv kev lag luam semiconductor, cov roj siv los loj hlob ib lossis ntau txheej ntawm cov khoom siv los ntawm cov tshuaj vapor deposition ntawm ib tug ua tib zoo xaiv substrate hu ua epitaxial gas.

Feem ntau siv silicon epitaxial gases xws li dichlorosilane, silicon tetrachloride thiabsilane ua. Feem ntau yog siv rau epitaxial silicon deposition, silicon oxide zaj duab xis deposition, silicon nitride zaj duab xis deposition, amorphous silicon zaj duab xis deposition rau lub hnub ci hlwb thiab lwm yam photoreceptors, thiab lwm yam Epitaxy yog ib tug txheej txheem nyob rau hauv uas ib tug siv lead ua khoom yog deposited thiab loj hlob nyob rau hauv ib tug substrate.

Chemical Vapor Deposition (CVD) Mixed Gas

CVD yog ib txoj hauv kev tso qee cov ntsiab lus thiab cov tebchaw los ntawm cov roj theem tshuaj tiv thaiv uas siv cov tshuaj tsis muaj zog, piv txwv li, ib txoj hauv kev tsim cov yeeb yaj kiab siv cov tshuaj tiv thaiv roj theem. Nyob ntawm seb hom zaj duab xis tsim, cov tshuaj vapor deposition (CVD) roj siv kuj txawv.

DopingMixed Gas

Hauv kev tsim cov khoom siv semiconductor thiab kev sib xyaw ua ke, qee qhov impurities yog doped rau hauv cov khoom siv semiconductor kom muab cov ntaub ntawv uas yuav tsum tau muaj cov khoom siv hluav taws xob thiab qee qhov kev tiv thaiv los tsim cov resistors, PN junctions, faus txheej, thiab lwm yam. Cov roj siv hauv cov txheej txheem doping yog hu ua doping gas.

Feem ntau suav nrog arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, thiab lwm yam.

Feem ntau, cov khoom siv doping yog tov nrog cov khoom siv roj (xws li argon thiab nitrogen) hauv qhov chaw txee. Tom qab sib tov, cov roj ntws tau txuas ntxiv mus rau hauv lub qhov cub tawg thiab nyob ib puag ncig lub wafer, tso cov dopants rau ntawm qhov chaw ntawm lub wafer, thiab tom qab ntawd rov ua dua nrog silicon los tsim cov hlau doped uas txav mus rau hauv silicon.

EtchingGas sib tov

Etching yog txhawm rau tshem tawm qhov chaw ua haujlwm (xws li cov yeeb yaj kiab hlau, silicon oxide zaj duab xis, thiab lwm yam) ntawm lub substrate yam tsis muaj photoresist masking, thaum khaws cia thaj chaw nrog photoresist masking, thiaj li yuav tau txais cov qauv duab xav tau ntawm lub substrate nto.

Etching txoj kev muaj xws li ntub tshuaj etching thiab qhuav tshuaj etching. Cov roj siv hauv cov tshuaj etching qhuav hu ua etching gas.

Etching gas feem ntau yog fluoride gas (halide), xws licarbon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, thiab lwm yam.