Cov roj tshwj xeebtxawv ntawm qhov davindustrial gasesnyob rau hauv hais tias lawv muaj kev siv tshwj xeeb thiab siv nyob rau hauv tej yam. Lawv muaj cov kev cai tshwj xeeb rau purity, impurity cov ntsiab lus, muaj pes tsawg leeg, thiab lub cev thiab tshuaj. Piv nrog rau cov khoom siv roj, cov roj tshwj xeeb muaj ntau yam sib txawv, tab sis muaj cov khoom me me thiab cov khoom muag.

Covcov pa roj sib xyawthiabtxheem calibration gasespeb feem ntau siv yog cov khoom tseem ceeb ntawm cov roj tshwj xeeb. Cov roj sib xyaw feem ntau yog muab faib ua cov roj sib xyaw ua ke thiab cov roj hluav taws xob sib xyaw.

General mixed gases muaj xws li:laser mix gas, ntsuas ntsuas cov roj sib xyaw, vuam sib xyaw roj, khaws cia sib xyaw roj, hluav taws xob teeb pom kev sib xyaw roj, kev tshawb fawb txog kev kho mob thiab cov roj ntsha sib xyaw ua ke, tshuaj tua kab mob thiab ua kom tsis muaj menyuam sib xyaw roj, ntsuas lub tswb sib xyaw cov roj, cov pa hluav taws xob siab sib xyaw, thiab huab cua xoom qib.

Cov khoom siv hluav taws xob hauv hluav taws xob muaj xws li cov khoom siv hluav taws xob epitaxial, cov tshuaj vapor deposition roj sib tov, doping roj sib tov, etching roj sib tov, thiab lwm yam khoom siv hluav taws xob. Cov roj sib tov no ua lub luag haujlwm tseem ceeb hauv kev lag luam semiconductor thiab microelectronics thiab tau siv dav hauv cov khoom siv hluav taws xob loj (LSI) thiab kev tsim hluav taws xob loj heev (VLSI), nrog rau hauv cov khoom siv hluav taws xob semiconductor.

5 Hom hluav taws xob sib xyaw ua ke yog siv ntau tshaj plaws

Doping mixed gas

Hauv kev tsim cov khoom siv hluav taws xob semiconductor thiab kev sib xyaw ua ke, qee qhov impurities tau nkag mus rau hauv cov khoom siv semiconductor los faib cov kev xav tau thiab kev tiv thaiv, ua rau kev tsim cov resistors, PN junctions, faus txheej, thiab lwm yam ntaub ntawv. Cov roj siv hauv cov txheej txheem doping yog hu ua dopant gases. Cov pa roj no feem ntau suav nrog arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, thiab diborane. Qhov chaw dopant feem ntau yog sib xyaw nrog cov khoom siv roj (xws li argon thiab nitrogen) hauv qhov chaw txee. Cov roj sib xyaw yog tom qab ntawd txuas ntxiv mus rau hauv lub qhov cub tawg thiab ncig ncig lub wafer, tso cov dopant rau ntawm qhov chaw wafer. Cov dopant ces reacts nrog silicon los tsim ib tug dopant hlau uas migrates rau hauv silicon.

Epitaxial loj hlob roj sib tov

Epitaxial kev loj hlob yog txheej txheem ntawm kev tso nyiaj thiab loj hlob ib qho khoom siv lead ua rau ib qho chaw substrate. Hauv kev lag luam semiconductor, cov roj siv los loj hlob ib lossis ntau txheej ntawm cov khoom siv tshuaj vapor deposition (CVD) ntawm ib qho kev ua tib zoo xaiv substrate hu ua epitaxial gases. Feem ntau silicon epitaxial gases muaj xws li dihydrogen dichlorosilane, silicon tetrachloride, thiab silane. Lawv feem ntau yog siv rau epitaxial silicon deposition, polycrystalline silicon deposition, silicon oxide zaj duab xis deposition, silicon nitride zaj duab xis deposition, thiab amorphous silicon zaj duab xis deposition rau lub hnub ci hlwb thiab lwm yam photosensitive li.

Ion implantation gas

Hauv cov khoom siv hluav taws xob semiconductor thiab kev tsim hluav taws xob sib xyaw ua ke, cov roj siv hluav taws xob siv hauv cov txheej txheem ion implantation yog sib sau ua ke hu ua ion implantation gases. Ionized impurities (xws li boron, phosphorus, thiab arsenic ions) tau nrawm mus rau qib siab zog ua ntej cog rau hauv lub substrate. Ion implantation technology feem ntau yog siv los tswj qhov pib voltage. Tus nqi ntawm implanted impurities tuaj yeem txiav txim siab los ntawm kev ntsuas cov ion beam tam sim no. Ion implantation gases feem ntau muaj xws li phosphorus, arsenic, thiab boron gases.

Etching mixed gas

Etching yog txheej txheem ntawm etching tawm ntawm qhov chaw ua tiav (xws li cov yeeb yaj kiab hlau, silicon oxide zaj duab xis, thiab lwm yam) ntawm lub substrate uas tsis npog los ntawm photoresist, thaum khaws cia thaj chaw npog los ntawm photoresist, thiaj li yuav tau txais cov qauv duab uas yuav tsum tau ua ntawm lub substrate nto.

Chemical Vapor Deposition Gas Mixture

Chemical vapor deposition (CVD) siv cov volatile tebchaw los tso ib yam khoom los yog compound los ntawm cov tshuaj vapor-phase tshuaj. Qhov no yog ib txoj hauv kev ua yeeb yaj kiab uas siv cov tshuaj vapor-phase tshuaj tiv thaiv. CVD gases siv sib txawv nyob ntawm seb hom zaj duab xis raug tsim.