Hydrogen chlorideyog ib qho tsis muaj xim tsis muaj roj nrog cov ntxhiab tsw. Nws cov tshuaj aqueous hu ua hydrochloric acid, tseem hu ua hydrochloric acid. Hydrogen chloride yog soluble hauv dej heev. Ntawm 0 ° C, 1 ntim dej tuaj yeem yaj txog 500 ntim ntawm hydrogen chloride.

Nws muaj cov yam ntxwv thiab cov yam ntxwv hauv qab no:

1. High purity

Lub purity ntawm qib hluav taws xobhydrogen chlorideyog siab heev, feem ntau ntawm ppm lossis qis dua, kom paub meej tias tsis muaj impurities tau nkag rau hauv cov txheej txheem tsim khoom semiconductor.

2. Inertness

Nws yog chemically inert gas uas tsis hnov ​​​​mob nrog ntau lwm yam tshuaj, uas yog ib qho tseem ceeb heev los tiv thaiv kev kis kab mob ntawm cov khoom siv semiconductor thiab cov khoom siv.

3. Kev ruaj ntseg siab

Electronic qibhydrogen chloridefeem ntau muaj chemistry ruaj khov kom ntseeg tau tias kev ua haujlwm semiconductor.

Hauv kev ua cov semiconductor, cov ntawv thov tseem ceeb ntawm cov qib hluav taws xob hydrogen chloride suav nrog:

1. Kev tu thiab kev npaj ntawm qhov chaw

Raws li kev siv lub tshuab ntxhua khaub ncaws zoo, qib hluav taws xobhydrogen chlorideyog siv los tshem tawm oxides thiab impurities los ntawm substrate nto los xyuas kom meej qhov zoo thiab purity ntawm epitaxial txheej los yog zaj duab xis.

2.Epitaxial kev loj hlob pab

Siv los ua tus neeg sawv cev kho deg hauv cov txheej txheem epitaxial, nws pab txhim kho cov txheej txheem epitaxial zoo, txhim kho lattice matching, thiab txo qhov tsim ntawm lattice defects.

3. Substrate pretreatment

Ua ntej kev npaj cov khoom siv semiconductor, qib hluav taws xobhydrogen chloridetuaj yeem siv los kho lub substrate nto los tsim lub hauv paus ruaj khov los txhim kho qhov adhesion ntawm epitaxial txheej thiab substrate.

4. Deposition auxiliary agent

Nyob rau hauv cov txheej txheem ntawm cov tshuaj vapor deposition (CVD) los yog lub cev vapor deposition (PVD), hluav taws xob qib hydrogen chloride yuav siv tau raws li ib tug roj theem nruab nrab mus koom nyob rau hauv lub deposition cov tshuaj tiv thaiv ntawm semiconductor cov ntaub ntawv.

5. Gas-theem hloov tus neeg sawv cev

Raws li cov roj-theem hloov pauv tus neeg sawv cev, lwm cov gaseous precursors tau nkag mus rau hauv cov tshuaj tiv thaiv chamber los pab kho tus nqi deposition thiab uniformity ntawm cov khoom.

Cov yam ntxwv no ua rau qib hluav taws xobhydrogen chlorideib qho tseem ceeb ua tus neeg sawv cev hauv cov tshuab semiconductor, uas muaj qhov cuam tshuam tseem ceeb ntawm kev ua haujlwm thiab kev ntseeg siab ntawm cov cuab yeej kawg.

Ntxiv rau kev siv cov khoom siv semiconductor, cov khoom siv hluav taws xob qib hydrogen chloride tuaj yeem nrhiav tau ntau yam kev siv hauv lwm qhov chaw, xws li: Kev npaj cov khoom siv purity siab, Roj Cells, Semiconductor cov ntaub ntawv loj hlob, Vapor Phase Lithography, Cov Khoom Siv Tshuaj Ntsuam Xyuas, Kev Tshawb Fawb Tshuaj.

Feem ntau, qib hluav taws xobhydrogen chlorideyog ntau yam, siab purity gas uas muaj ntau yam kev siv sab nraud ntawm semiconductor manufacturing.