Qhov Loj tshaj plaws ntawm Cov Hluav Taws Xob Tshwj Xeeb Gas - Nitrogen Trifluoride NF3

Peb lub teb chaws txoj kev lag luam semiconductor thiab vaj huam sib luag kev lag luam tuav ib theem siab ntawm kev vam meej. Nitrogen trifluoride, uas yog ib qho tseem ceeb thiab loj tshaj plaws-ntim hluav taws xob tshwj xeeb roj hauv kev tsim thiab ua cov panels thiab semiconductors, muaj qhov chaw ua lag luam dav.

Feem ntau siv fluorine-muaj cov roj hluav taws xob tshwj xeeb suav nrogsulfur hexafluoride (SF6)tungsten hexafluoride (WF6),Cov pa roj carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) thiab octafluoropropane (C3F8). Nitrogen trifluoride (NF3) feem ntau yog siv los ua cov tshuaj fluorine rau hydrogen fluoride-fluoride gas high-zog tshuaj lasers. Qhov ua tau zoo (kwv yees li 25%) ntawm cov tshuaj tiv thaiv lub zog ntawm H2-O2 thiab F2 tuaj yeem tso tawm los ntawm cov hluav taws xob laser, yog li HF-OF lasers yog cov lasers zoo tshaj plaws ntawm cov tshuaj lasers.

Nitrogen trifluoride yog ib qho zoo heev plasma etching gas hauv microelectronics kev lag luam. Rau etching silicon thiab silicon nitride, nitrogen trifluoride muaj ntau dua etching tus nqi thiab xaiv ntau dua carbon tetrafluoride thiab sib tov ntawm carbon tetrafluoride thiab oxygen, thiab tsis muaj kuab paug rau saum npoo. Tshwj xeeb tshaj yog nyob rau hauv etching ntawm integrated Circuit Court cov ntaub ntawv nrog ib tug tuab ntawm tsawg tshaj li 1.5um, nitrogen trifluoride muaj ib tug zoo heev etching tus nqi thiab xaiv, tsis muaj residue nyob rau saum npoo ntawm cov khoom etched, thiab kuj yog ib tug zoo heev tu tus neeg saib xyuas. Nrog rau txoj kev loj hlob ntawm nanotechnology thiab kev loj hlob ntawm kev lag luam hluav taws xob, nws qhov kev thov yuav nce ib hnub.

Raws li hom fluorine-muaj roj tshwj xeeb, nitrogen trifluoride (NF3) yog cov khoom siv hluav taws xob tshwj xeeb loj tshaj plaws hauv khw. Nws yog chemically inert nyob rau hauv chav tsev kub, muaj zog tshaj oxygen, ruaj khov dua fluorine, thiab yooj yim rau kev kub siab.

Nitrogen trifluoride feem ntau yog siv los ua plasma etching roj thiab cov tshuaj tiv thaiv chamber tu tus neeg sawv cev, tsim rau kev tsim khoom xws li semiconductor chips, vaj huam sib luag tiaj tus, optical fibers, photovoltaic cells, thiab lwm yam.

Piv nrog rau lwm cov khoom siv hluav taws xob uas muaj fluorine, nitrogen trifluoride muaj qhov zoo ntawm cov tshuaj tiv thaiv sai thiab kev ua haujlwm siab, tshwj xeeb tshaj yog nyob rau hauv etching ntawm silicon-muaj cov ntaub ntawv xws li silicon nitride, nws muaj ib tug siab etching tus nqi thiab selectivity, tsis muaj residue nyob rau saum npoo ntawm lub etched khoom, thiab kuj yog ib tug zoo heev tu tus neeg saib xyuas, thiab nws yog tsis-polluting txheej txheem.