Feem ntau siv hluav taws xob tshwj xeeb roj - nitrogen trifluoride

Feem ntau cov fluorine-muaj cov roj hluav taws xob tshwj xeeb suav nrogsulfur hexafluoride (SF6)tungsten hexafluoride (WF6),Cov pa roj carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) thiab octafluoropropane (C3F8).

Nrog rau txoj kev loj hlob ntawm nanotechnology thiab kev loj hlob ntawm kev lag luam hluav taws xob, nws qhov kev thov yuav nce ib hnub. Nitrogen trifluoride, uas yog ib qho tseem ceeb thiab loj tshaj plaws-siv cov roj hluav taws xob tshwj xeeb hauv kev tsim thiab ua cov panels thiab semiconductors, muaj qhov chaw ua lag luam dav.

Raws li hom fluorine-muaj roj tshwj xeeb,nitrogen trifluoride (NF3)yog cov khoom siv hluav taws xob tshwj xeeb nrog cov khoom lag luam loj tshaj plaws. Nws yog chemically inert nyob rau hauv chav tsev kub, muaj zog ntau dua oxygen ntawm qhov kub thiab txias, ruaj khov dua fluorine, thiab yooj yim rau kev tswj. Nitrogen trifluoride feem ntau yog siv los ua plasma etching roj thiab cov tshuaj tiv thaiv chamber tu tus neeg saib xyuas, thiab tsim nyog rau kev tsim khoom ntawm semiconductor chips, vaj huam sib luag tiaj tus, optical fibers, photovoltaic cells, thiab lwm yam.

Piv nrog rau lwm cov roj hluav taws xob uas muaj fluorine,nitrogen trifluoridemuaj qhov zoo ntawm cov tshuaj tiv thaiv sai thiab ua haujlwm siab. Tshwj xeeb tshaj yog nyob rau hauv etching ntawm silicon-muaj cov ntaub ntawv xws li silicon nitride, nws muaj ib tug siab etching tus nqi thiab selectivity, tsis muaj residue nyob rau saum npoo ntawm cov khoom etched. Nws kuj yog tus neeg saib xyuas zoo heev thiab tsis muaj kuab paug rau saum npoo, uas tuaj yeem ua tau raws li qhov xav tau ntawm cov txheej txheem ua haujlwm.