Cov khoom
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Cov pa oxygen (O2)
Oxygen yog ib hom pa roj uas tsis muaj xim thiab tsis muaj ntxhiab. Nws yog hom pa roj uas feem ntau siv. Raws li thev naus laus zis, pa roj yog rho tawm los ntawm cov txheej txheem ua kua hauv huab cua, thiab pa roj hauv huab cua muaj li ntawm 21%. Pa roj yog ib hom pa roj tsis muaj xim thiab tsis muaj ntxhiab nrog cov mis tshuaj O2, uas yog hom pa roj feem ntau siv. Lub ntsiab lus yaj yog -218.4 ° C, thiab lub ntsiab lus npau yog -183 ° C. Nws tsis yooj yim yaj hauv dej. Kwv yees li 30 mL ntawm pa roj yaj hauv 1 L dej, thiab cov pa roj ua kua yog xiav ntuj. -
Cov pa roj sulfur dioxide (SO2)
Sulfur dioxide (sulfur dioxide) yog cov sulfur oxide uas feem ntau, yooj yim tshaj plaws, thiab ua rau khaus nrog cov tshuaj formula SO2. Sulfur dioxide yog cov roj tsis muaj xim thiab pob tshab nrog cov ntxhiab tsw qab. Yaj hauv dej, ethanol thiab ether, cov kua sulfur dioxide yog qhov ruaj khov, tsis ua haujlwm, tsis kub hnyiab, thiab tsis tsim cov khoom sib xyaw nrog huab cua. Sulfur dioxide muaj cov khoom ua kom dawb. Sulfur dioxide feem ntau siv hauv kev lag luam los ua kom cov pulp, wool, silk, straw kaus mom, thiab lwm yam. Sulfur dioxide kuj tseem tuaj yeem tiv thaiv kev loj hlob ntawm pwm thiab cov kab mob. -
Ethylene Oxide (ETO)
Ethylene oxide yog ib qho ntawm cov cyclic ethers yooj yim tshaj plaws. Nws yog ib qho heterocyclic compound. Nws cov mis tshuaj yog C2H4O. Nws yog ib qho tshuaj lom carcinogen thiab yog ib qho khoom lag luam petrochemical tseem ceeb. Cov khoom siv tshuaj ntawm ethylene oxide yog cov khoom siv heev. Nws tuaj yeem dhau los ua cov tshuaj tiv thaiv ntxiv nrog ntau cov tshuaj thiab tuaj yeem txo cov nyiaj nitrate. -
1,3 Butadiene (C4H6)
1,3-Butadiene yog ib qho organic compound nrog cov mis tshuaj C4H6. Nws yog ib qho roj tsis muaj xim nrog me ntsis tsw qab thiab yooj yim rau liquefy. Nws tsis muaj tshuaj lom thiab nws cov tshuaj lom zoo ib yam li ethylene, tab sis nws muaj kev khaus rau daim tawv nqaij thiab cov ntaub so ntswg, thiab muaj cov nyhuv anesthetic ntawm cov concentration siab. -
Hydrogen (H2)
Hydrogen muaj cov mis tshuaj ntawm H2 thiab qhov hnyav molecular ntawm 2.01588. Nyob rau hauv qhov kub thiab txias ib txwm muaj, nws yog ib qho roj uas yooj yim hlawv, tsis muaj xim, pob tshab, tsis muaj ntxhiab thiab tsis muaj saj uas nyuaj rau yaj hauv dej, thiab tsis cuam tshuam nrog feem ntau cov tshuaj. -
Neon (Ne)
Neon yog ib qho roj tsis muaj xim, tsis muaj ntxhiab, tsis yooj yim hlawv nrog cov mis tshuaj ntawm Ne. Feem ntau, neon tuaj yeem siv ua roj rau cov teeb neon xim rau cov khoom tshaj tawm sab nraum zoov, thiab kuj tuaj yeem siv rau cov cim qhia lub teeb pom kev zoo thiab kev tswj hluav taws xob. Thiab cov khoom sib xyaw roj laser. Cov roj zoo li Neon, Krypton thiab Xenon kuj tseem siv tau los sau cov khoom iav kom txhim kho lawv cov kev ua tau zoo lossis kev ua haujlwm. -
Cov pa roj carbon tetrafluoride (CF4)
Cov pa roj carbon tetrafluoride, tseem hu ua tetrafluoromethane, yog cov pa roj tsis muaj xim ntawm qhov kub thiab txias ib txwm muaj, tsis yaj hauv dej. Cov pa roj CF4 tam sim no yog cov pa roj plasma etching siv ntau tshaj plaws hauv kev lag luam microelectronics. Nws kuj tseem siv ua cov pa roj laser, cov khoom siv txias cryogenic, cov kuab tshuaj, cov roj nplua nyeem, cov khoom siv rwb thaiv tsev, thiab cov dej txias rau cov raj xa dej infrared. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, yog roj lom, feem ntau yog siv los ua tshuaj tua kab. Vim tias sulfuryl fluoride muaj cov yam ntxwv ntawm kev sib kis thiab permeability zoo, tshuaj tua kab dav dav, tshuaj tsawg, cov seem tsawg, tua kab sai, roj tawg sai, siv tau yooj yim ntawm qhov kub qis, tsis muaj kev cuam tshuam rau qhov nrawm ntawm kev tawg thiab tsis muaj tshuaj lom, nws yog siv ntau dua thiab ntau dua hauv cov tsev rau khoom, nkoj thauj khoom, tsev, pas dej, tiv thaiv kab ntsaum, thiab lwm yam. -
Silane (SiH4)
Silane SiH4 yog ib qho roj uas tsis muaj xim, lom thiab nquag siv heev ntawm qhov kub thiab txias ib txwm muaj. Silane siv dav hauv kev loj hlob ntawm silicon, cov ntaub ntawv raw rau polysilicon, silicon oxide, silicon nitride, thiab lwm yam, cov hlwb hnub ci, cov fiber ntau, kev tsim iav xim, thiab kev tso pa tshuaj lom neeg. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, roj purity: 99.999%, feem ntau siv ua cov khoom noj aerosol propellant thiab roj nruab nrab. Nws feem ntau siv rau hauv semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 siv los hloov CF4 lossis C2F6, siv ua roj ntxuav thiab semiconductor txheej txheem etching roj. -
Nitric Oxide (TSIS MUAJ)
Cov pa roj nitric oxide yog ib qho tshuaj sib xyaw ua ke ntawm nitrogen nrog cov mis tshuaj NO. Nws yog ib qho pa roj tsis muaj xim, tsis muaj ntxhiab, thiab lom uas tsis yaj hauv dej. Nitric oxide muaj zog heev hauv kev tshuaj lom neeg thiab ua rau cov pa roj nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas yog ib hom roj tsis muaj xim nrog ib qho tsw ntxhiab tsw qab. Nws cov kua dej hu ua hydrochloric acid, tseem hu ua hydrochloric acid. Hydrogen chloride feem ntau yog siv los ua cov xim zas, cov txuj lom, tshuaj, ntau yam chlorides thiab cov tshuaj tiv thaiv xeb.
