Tshwj xeeb Gases
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS Nr .: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, tseem hu ua luag nyav, yog cov tshuaj txaus ntshai nrog cov tshuaj formula N2O. Nws yog xim tsis muaj xim, tsw ntxhiab tsw. N2O yog ib qho oxidant uas tuaj yeem txhawb combustion nyob rau hauv tej yam kev mob, tab sis yog ruaj khov nyob rau hauv chav tsev kub thiab muaj ib tug me ntsis tshuaj loog. , thiab tuaj yeem ua rau tib neeg luag. -
Cov pa roj carbon tetrafluoride (CF4)
Cov pa roj carbon tetrafluoride, tseem hu ua tetrafluoromethane, yog cov roj tsis muaj xim ntawm qhov kub thiab txias, insoluble hauv dej. CF4 gas tam sim no yog cov roj plasma etching ntau tshaj plaws hauv kev lag luam microelectronics. Nws kuj tseem siv tau los ua cov roj laser, cov tub yees txias, cov kuab tshuaj, cov roj nplua nyeem, cov khoom siv insulating, thiab cov dej txias rau cov raj infrared detector. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, cov pa phem, feem ntau yog siv los ua tshuaj tua kab. Vim tias sulfuryl fluoride muaj cov yam ntxwv ntawm qhov muaj zog diffusion thiab permeability, broad-spectrum insecticide, tsawg npaum li cas, tsawg seem seem, ceev cov tshuaj tua kab ceev, luv roj dispersion lub sij hawm, yooj yim siv nyob rau hauv qis kub, tsis cuam tshuam rau germination tus nqi thiab tsawg toxicity, ntau Nws yog dav siv nyob rau hauv warehouses, cargo ships, tsev, reservoir dams, termite tiv thaiv, thiab lwm yam. -
Silane (SiH4)
Silane SiH4 yog xim tsis muaj xim, muaj kuab lom thiab muaj zog heev compressed roj ntawm qhov kub thiab txias. Silane yog dav siv nyob rau hauv epitaxial kev loj hlob ntawm silicon, raw cov ntaub ntawv rau polysilicon, silicon oxide, silicon nitride, thiab lwm yam., solar cells, optical fibers, colored iav manufacturing, thiab tshuaj vapor deposition. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, roj purity: 99.999%, feem ntau siv los ua zaub mov aerosol propellant thiab nruab nrab roj. Nws yog feem ntau siv hauv semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) txheej txheem, C4F8 yog siv los hloov CF4 lossis C2F6, siv los ntxuav cov pa roj thiab cov txheej txheem semiconductor etching gas. -
Nitric Oxide (NO)
Nitric oxide roj yog ib qho sib xyaw ntawm nitrogen nrog cov tshuaj formula NO. Nws yog ib qho tsis muaj xim, tsis muaj ntxhiab, muaj kuab lom uas yog insoluble hauv dej. Nitric oxide yog chemically reactive thiab reacts nrog oxygen los tsim cov corrosive gas nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas yog cov roj tsis muaj xim nrog cov ntxhiab tsw. Nws cov tshuaj aqueous hu ua hydrochloric acid, tseem hu ua hydrochloric acid. Hydrogen chloride feem ntau yog siv los ua dyes, txuj lom, tshuaj, ntau yam chlorides thiab corrosion inhibitors. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, tshuaj formula: C3F6, yog cov roj tsis muaj xim ntawm qhov kub thiab txias. Nws yog siv los npaj ntau yam tshuaj fluorine uas muaj cov tshuaj zoo, tshuaj intermediates, tshuaj tua hluav taws, thiab lwm yam, thiab tseem tuaj yeem siv los npaj cov khoom siv fluorine-muaj polymer. -
Ammonia (NH3)
Kua ammonia / anhydrous ammonia yog ib qho tseem ceeb tshuaj raw khoom nrog ntau yam kev siv. Cov kua ammonia tuaj yeem siv los ua cov tub yees. Nws yog tsuas yog siv los tsim nitric acid, urea thiab lwm yam tshuaj chiv, thiab tseem siv tau los ua raw khoom rau tshuaj thiab tshuaj tua kab. Hauv kev lag luam tiv thaiv, nws yog siv los ua propellants rau rockets thiab missiles.
