Cov Roj Tshwj Xeeb
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Sulfur Tetrafluoride (SF4)
EINECS TSIS MUAJ: 232-013-4
CAS TSIS MUAJ: 7783-60-0 -
Cov pa roj nitrous (N2O)
Nitrous oxide, tseem hu ua roj luag, yog ib yam tshuaj lom neeg txaus ntshai nrog cov mis tshuaj N2O. Nws yog ib yam roj tsis muaj xim, tsw qab zib. N2O yog ib yam tshuaj oxidant uas tuaj yeem txhawb kev kub hnyiab hauv qee qhov xwm txheej, tab sis nws ruaj khov ntawm qhov kub thiab txias hauv chav tsev thiab muaj qhov cuam tshuam me ntsis rau kev ua kom loog. , thiab tuaj yeem ua rau tib neeg luag. -
Cov pa roj carbon tetrafluoride (CF4)
Cov pa roj carbon tetrafluoride, tseem hu ua tetrafluoromethane, yog cov pa roj tsis muaj xim ntawm qhov kub thiab txias ib txwm muaj, tsis yaj hauv dej. Cov pa roj CF4 tam sim no yog cov pa roj plasma etching siv ntau tshaj plaws hauv kev lag luam microelectronics. Nws kuj tseem siv ua cov pa roj laser, cov khoom siv txias cryogenic, cov kuab tshuaj, cov roj nplua nyeem, cov khoom siv rwb thaiv tsev, thiab cov dej txias rau cov raj xa dej infrared. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, yog roj lom, feem ntau yog siv los ua tshuaj tua kab. Vim tias sulfuryl fluoride muaj cov yam ntxwv ntawm kev sib kis thiab permeability zoo, tshuaj tua kab dav dav, tshuaj tsawg, cov seem tsawg, tua kab sai, roj tawg sai, siv tau yooj yim ntawm qhov kub qis, tsis muaj kev cuam tshuam rau qhov nrawm ntawm kev tawg thiab tsis muaj tshuaj lom, nws yog siv ntau dua thiab ntau dua hauv cov tsev rau khoom, nkoj thauj khoom, tsev, pas dej, tiv thaiv kab ntsaum, thiab lwm yam. -
Silane (SiH4)
Silane SiH4 yog ib qho roj uas tsis muaj xim, lom thiab nquag siv heev ntawm qhov kub thiab txias ib txwm muaj. Silane siv dav hauv kev loj hlob ntawm silicon, cov ntaub ntawv raw rau polysilicon, silicon oxide, silicon nitride, thiab lwm yam, cov hlwb hnub ci, cov fiber ntau, kev tsim iav xim, thiab kev tso pa tshuaj lom neeg. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, roj purity: 99.999%, feem ntau siv ua cov khoom noj aerosol propellant thiab roj nruab nrab. Nws feem ntau siv rau hauv semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 siv los hloov CF4 lossis C2F6, siv ua roj ntxuav thiab semiconductor txheej txheem etching roj. -
Nitric Oxide (TSIS MUAJ)
Cov pa roj nitric oxide yog ib qho tshuaj sib xyaw ua ke ntawm nitrogen nrog cov mis tshuaj NO. Nws yog ib qho pa roj tsis muaj xim, tsis muaj ntxhiab, thiab lom uas tsis yaj hauv dej. Nitric oxide muaj zog heev hauv kev tshuaj lom neeg thiab ua rau cov pa roj nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas yog ib hom roj tsis muaj xim nrog ib qho tsw ntxhiab tsw qab. Nws cov kua dej hu ua hydrochloric acid, tseem hu ua hydrochloric acid. Hydrogen chloride feem ntau yog siv los ua cov xim zas, cov txuj lom, tshuaj, ntau yam chlorides thiab cov tshuaj tiv thaiv xeb. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, cov mis tshuaj: C3F6, yog cov roj tsis muaj xim ntawm qhov kub thiab txias ib txwm muaj. Nws feem ntau yog siv los npaj ntau yam tshuaj lom neeg zoo uas muaj fluorine, cov tshuaj nruab nrab, cov neeg tua hluav taws, thiab lwm yam, thiab tseem siv tau los npaj cov khoom siv polymer uas muaj fluorine. -
Ammonia (NH3)
Cov kua ammonia / anhydrous ammonia yog ib yam khoom siv tshuaj lom neeg tseem ceeb uas muaj ntau yam kev siv. Cov kua ammonia siv tau ua cov khoom siv txias. Nws feem ntau yog siv los tsim cov kua qaub nitric, urea thiab lwm yam chiv chiv, thiab kuj siv tau ua cov khoom siv raw rau tshuaj thiab tshuaj tua kab. Hauv kev lag luam tiv thaiv, nws yog siv los ua cov roj rau cov foob pob hluav taws thiab cov foob pob hluav taws.
